Configuring optical layers in imprint lithography processes

A multilayer wearable eyepiece, comprising:

• a substrate;
• a first waveguide on a side of the substrate, the first waveguide comprising:
• first diffraction gratings configured to project light of a first wavelength range and to focus a virtual image at a first depth plane, wherein the first diffraction gratings comprise a first incoupling grating and form a first orthogonal pupil expander region and a first exit pupil expander expander region;
• a functional pattern, wherein the functional pattern comprises first features of a first size range at first locations;
• and
• an auxiliary pattern surrounding the functional pattern, the auxiliary pattern comprising:
• additional first features of the first size range, wherein the additional first features comprise anti-reflective features;
• and
• second features of a second size range respectively at second locations spaced laterally apart from the first locations on the side of the substrate, the second size range being at least an order of magnitude greater in size than the first size range;
• and
• a second waveguide attached to the first waveguide along the second features to define a gap of the second size range between the first waveguide and the second waveguide, the second waveguide comprising second diffraction gratings configured to project light of a second wavelength range and to focus the virtual image at a second depth plane, wherein the second diffraction gratings comprise a second incoupling grating and form a second orthogonal pupil expander region and a second exit pupil expander region.