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US 2020/0347500 A1Published application
Device for conveying a gas into a chemical vapour deposition reactor
AssigneeKobus SAS
InventorsPatrice Nal, Christophe Borean
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AssigneeKobus SAS
InventorsPatrice Nal, Christophe Borean
Estimating the term…
The present invention concerns a gas circulation device (1) for conveying a gas into a chemical vapour deposition reactor, comprising a conduit (2) with a first end (4) intended to open into said reactor, being polarised at a radiofrequency potential (V) and a second end (3) electrically polarised at a reference potential (V0), the device being characterised in that it further comprises a means (10a-10e) for applying potential for locally applying at least one determined electrical potential to the conduit (2) between the first and the second end, so as to locally polarise the gas in said conduit at an intermediate electrical potential between the radiofrequency potential and the reference potential.
A gas circulation device for conveying a gas into a chemical vapour deposition reactor, comprising a conduit with a first end intended to open into said reactor while being polarised at a radiofrequency potential and a second end electrically polarised at a reference potential, the device further comprising a potential applying means for locally applying at least one determined electrical potential to the conduit between the first and the second end, so as to locally polarise the gas in said conduit at an intermediate electrical potential between the radio frequency potential and the reference potential.
A method for preventing plasma formation in a gas circulation device for conveying a gas to a chemical vapour deposition reactor, comprising a conduit with a first end opening into said reactor while being polarised at a radiofrequency potential and a second end electrically polarised at a reference potential, said method further comprising locally applying at least one determined electrical potential to the conduit between the first and the second end, so as to locally polarise the gas in said conduit at an intermediate electrical potential between the radiofrequency potential and the reference potential.
Dependencies are inferred from the claim text.