Vanadium silicon carbonitride film, vanadium silicon carbonitride film coated member, and method for manufacturing the same

A method for manufacturing a vanadium silicon carbonitride film coated member,

• wherein the vanadium silicon carbonitride film coated member is manufactured by forming a vanadium silicon carbonitride film on a base material by a plasma chemical vapor deposition method using a raw material gas,
• the raw material gas comprising:
• a nitrogen source gas composed of one or more of gasses selected from the group consisting of a nitrogen gas and an ammonia gas;
• a hydrogen gas;
• a vanadium chloride gas;
• a silicon source gas;
• a carbon source gas, and
• wherein when vanadium element concentration [at %]/(vanadium element concentration [at %]+silicon element concentration [at %]+carbon element concentration [at %]+nitrogen element concentration [at %]) in the vanadium silicon carbonitride film is defined as a, and silicon element concentration [at %]/(vanadium element concentration [at %]+silicon element concentration [at %]+carbon element concentration [at %]+nitrogen element concentration [at %]) in the vanadium silicon carbonitride film is defined as b,
• 0.30≤a/b≤1.3 and 0.30≤a+b≤0.70 are satisfied, and a total of the vanadium element concentration [at %], the silicon element concentration [at %], the carbon element concentration [at %], and the nitrogen element concentration [at %] in the vanadium silicon carbonitride film is 90 [at %] or more.