Copper Ionic Conductor Film

A method of forming a device, the method comprising the steps of:

• providing a substrate comprising a cathode;
• forming an electrolyte on the substrate by:
• depositing a mixture of sources for components of the crystalline ionic conductor film onto a substrate, the components comprising:
• i) Cu, ii) a component A selected from the group consisting of:
• Rb, Cs, K, Na, Li, and combinations thereof, and iii) a component B selected from the group consisting of:
• F, Cl, Br, I, and combinations thereof;
• and annealing the mixture under conditions sufficient to form a crystalline ionic conductor film as the electrolyte on the substrate comprising a metal halide having a formula:
• CuxAyBz, wherein 0<x<20, 0<y<10, and 0<z<30;
• and
• forming an anode on the electrolyte.

A device, comprising:

• a substrate comprising a cathode;
• an electrolyte disposed on the substrate, the electrolyte comprising a crystalline ionic conductor film having a formula:
• CuxAyBz, wherein A is selected from the group consisting of:
• Rb, Cs, K, Na, Li, and combinations thereof, wherein B is selected from the group consisting of:
• F, Cl, Br, I, and combinations thereof, and wherein 0<x<20, 0<y<10, and 0<z<30;
• and
• an anode disposed on the electrolyte.