Apparatus for annealing semiconductor integrated circuit wafers

An apparatus for annealing semiconductor integrated circuit wafers, the apparatus comprising:

• a microwave energy source configured to generate microwave radiation having a first wavelength;
• and
• a reactor housing configured to receive a plurality of semiconductor integrated circuit wafers simultaneously, the reactor housing including a top wall, a bottom wall, a left side wall, a right side wall, a front wall, and a back wall connected to one another to form a box-shaped internal chamber, each wall being electrically connected to electrical ground and each wall being water cooled, the walls of the internal chamber spaced apart such that the microwave radiation forms a single mode within the internal chamber, wherein each wafer is heated directly by the microwave radiation from the microwave energy source, and
• a wafer support structure including a plurality of columns, each column including a plurality of notches, wherein each semiconductor integrated circuit wafer is supported along an edge thereof by one notch of the respective columns.