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AssigneeTokyo Electron Limited
InventorsKotaro Tsurusaki, Koji Yamashita, Kazuya Koyama, Kouzou Kanagawa
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A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.
A substrate processing apparatus comprising:
A substrate processing method comprising:
Dependencies are inferred from the claim text.