US 2020/0286712 A1 · SINGLE-TURN AND LAMINATED-WALL INDUCTIVELY COUPLED PLASMA SOURCES

Abstract

This disclosure describes systems, methods, and apparatus for making and using a single-turn coil on a remote plasma source to reduce capacitive coupling between the coil and a plasma, and/or a laminated chamber wall including at least one conductive layer that reduces capacitive coupling between the coil and the plasma. Where a laminated chamber wall is used, the coil can either be a single or multi-turn coil. Additive processes can be used to fuse or bond the conductive layer(s) to lower layers (e.g., dielectric layers) as well as to fuse or bond a final layer (e.g., dielectric) to an outermost conductive layer. Further, a method is disclosed wherein a conductive layer within the lamination is biased during plasma ignition and then the bias is reduced after ignition.

Claims18

Dependent claims

A remote plasma source chamber with extended lifetime configured for coupling to a processing chamber, the remote plasma source chamber comprising:

a cylindrical chamber having:
an inner portion comprising a dielectric;
an outer portion comprising a dielectric;
a conductive middle portion between the inner and outer portion defining one or more magnetic-field-passage windows;
and
a conductive coil arranged outside but in contact with the cylindrical chamber, the conductive coil including a first end and a second end, the first end configured for coupling to a high voltage node of an alternating current power supply, the second end configured for coupling to a low voltage or ground node of the alternating current power supply.

3 more elements

Dependencies are inferred from the claim text.

Single-turn and laminated-wall inductively coupled plasma sources

Life of this patent

Single-turn and laminated-wall inductively coupled plasma sources

Life of this patent

Abstract

Claims18