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AssigneeASML Netherlands B.V.
InventorsMartinus Gerardus, Maria, Johannes MAASSEN, Peter Paul HEMPENIUS, Weiming REN, Zhongwei CHEN
Estimating the term…
A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets on a sample. A first portion of the array of beamlets is focused onto a focus plane, and a second portion of the array of beamlets has at least one beamlet with a defocusing level with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.
A charged particle beam apparatus, comprising:
A method performed by a controller for controlling a charged particle beam system, comprising:
A non-transitory computer-readable medium that stores a set of instructions that is executable by at least one processor of a controller to cause the controller to perform a method for controlling a charged particle beam system, the method comprising:
Dependencies are inferred from the claim text.