Semiconductor defect inspection apparatus and semiconductor defect inspection method

A semiconductor defect inspection method, comprising:

• irradiating an inspection target object with X-rays;
• detecting the X-rays that pass through the inspection target object;
• detecting fluorescent X-rays generated from the inspection target object;
• detecting whether a first defect is present by an analysis of a transmission X-ray image obtained by performing photoelectric conversion of the transmitted X-rays;
• detecting whether a second defect is present by a spectrum analysis of the fluorescent X-rays;
• and
• determining that a defect is present in the inspection target object in response to detecting a presence of at least one of the first defect or the second defect.

A system comprising:

• one or more processors programmed with machine-readable instructions to carry out control to:
• irradiate an inspection target object placed on a stage with X-rays;
• detect the X-rays which passed through the inspection target object are detected as transmitted X-rays;
• detect fluorescent X-rays generated from the inspection target object;
• detect whether a first defect is present by an analysis of a transmission X-ray image obtained by performing photoelectric conversion of the transmitted X-rays;
• detect whether a second defect is present by a spectrum analysis of the fluorescent X-rays;
• and
• determine that a defect is present in the inspection target object in response to detecting a presence of at least one of the first defect or the second defect.