Semiconductor device
AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorsMasataka INO, Hiroaki KATOU
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AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorsMasataka INO, Hiroaki KATOU
Estimating the term…
According to an embodiment, a semiconductor device includes a first electrode, a first semiconductor region, a second semiconductor region, a third semiconductor region, a gate electrode, a first conductive layer, and a second electrode. The gate electrode opposes, with a gate insulating portion interposed, a portion of the first semiconductor region, the second semiconductor region, and the third semiconductor region in a first direction. The first direction is perpendicular to a second direction. The second direction is from the first semiconductor region toward the second semiconductor region. The first conductive layer is provided inside the first semiconductor region with a first insulating layer interposed. Another portion of the first semiconductor region is provided between the first conductive layer and the second semiconductor region and between the first conductive layer and the gate electrode.
A semiconductor device, comprising:
Dependencies are inferred from the claim text.