Dual power feed rotary sputtering cathode

A rotary sputtering cathode assembly, comprising:

• a rotatable target cylinder having a first end and an opposing second end;
• a first end-block connected to the first end of the rotatable target cylinder, wherein the first end block includes a first set of rotary water seals configured to provide separation between water and atmosphere, and a first set of rotary vacuum seals configured to provide separation between vacuum and atmosphere;
• a first power transfer apparatus operatively coupled to the first end-block, the first power transfer apparatus including a first power supply bus and a first static conductive element coupled to the first power supply bus, wherein the first static conductive element is in contact with a first rotary electrical contact connected to the rotatable target cylinder;
• a second end-block coupled to the second end of the rotatable target cylinder, wherein the second end block includes a second set of rotary water seals configured to provide separation between water and atmosphere, a second set of rotary vacuum seals configured to provide separation between vacuum and atmosphere;
• a second power transfer apparatus operatively coupled to the second end-block, the second power transfer apparatus including a second power supply bus and a second static conductive element coupled to the second power supply bus, wherein the second static conductive element is in contact with a second rotary electrical contact connected to the rotatable target cylinder;
• and
• a radio frequency (RF) power supply operatively coupled to the first and second power supply busses, wherein an output of the RF power supply is connected to an output conductor;
• wherein the first and second power supply busses are respectively coupled to first and second input conductors, which are each coupled to the output conductor by a power splitter;
• wherein RF power signals from the RF power supply are configured to be delivered from the output conductor to the first and second power supply busses, to the first and second static conductive elements, to the first and second rotary electrical contacts, and to both of the first and second ends of the rotatable target cylinder during a sputtering operation.