Liquid processing apparatus and liquid processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorMasahito KASHIYAMA
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AssigneeSCREEN Holdings Co., Ltd.
InventorMasahito KASHIYAMA
Estimating the term…
A development liquid is discharged from a development liquid nozzle having one discharge port extending continuously in one direction to the substrate. The development liquid nozzle is fixed such that the development liquid is supplied to a reference straight line on an upper surface of the substrate, and is fixed such that a liquid receiving region that receives the development liquid on the upper surface of the substrate extends in a direction inclined with respect to the reference straight line, the reference straight line passing through a rotational center of the substrate. The development liquid nozzle is moved in a direction of the reference straight line. The liquid receiving region has one end and another end. The other end is located farther away from the rotational center of the substrate than the one end, and is located farther downstream in the rotation direction of the substrate than the one end.
A liquid processing apparatus that performs predetermined processing by supplying a processing liquid to a substrate, comprising:
A liquid processing method for performing predetermined processing by supplying a processing liquid to a substrate, including:
Dependencies are inferred from the claim text.