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US 2020/0198967 A1Published application
Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
AssigneeDowa Thermotech Co., Ltd.
InventorsSatoru HABUKA, Hiroyuki MATSUOKA, Wataru SAKAKIBARA
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Abstract
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at %/or less.
Claims10
A vanadium nitride film formed on a surface of a base material,
- wherein a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less,
A member coated with a vanadium nitride film,
- wherein a vanadium nitride film having a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration of 1.08 or more and a chlorine element concentration of 1 at % or more and 5 at % or less is formed on a surface of a base material.
A method for manufacturing a member coated with a vanadium nitride film, the method comprising:
- supplying a raw material gas containing a nitrogen source gas, a vanadium chloride gas, and a hydrogen gas in forming the vanadium nitride film on a surface of a base material;
- and
- forming a vanadium nitride film having a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration of 1.08 or more and a chlorine element concentration of 1 at % or more and 5 at % or less on the surface of the base material by a plasma chemical vapor deposition method.
Dependencies are inferred from the claim text.