Conductive and diffusive antireflection surface
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsHelga SZAMBOLICS, Cedric DUCROS, Nicolas DUNOYER, Emmanuel OLLIER
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Abstract
The invention relates to a scattering and conductive anti-reflection surface, comprising a continuous electrically conductive material of variable thickness deposited on a textured surface so as to render the assembly anti-reflective and scattering.
Claims13
Scattering and conductive anti-reflective surface, characterized in that it comprises a continuous electrically conductive material of variable thickness deposited on a textured surface so as to render the assembly anti-reflective and scattering, the surface comprising a surface structure of a material and an electrically conductive deposit whose texture is anisotropic in the plane, the texture forming valleys whose length is greater than the width and separated by walls of triangular section.
Process for fabricating a scattering and conductive anti-reflective surface, comprising the steps of:
- texturing a first surface by plasma etching of a transparent substrate such as glass so that this first surface effectively transmits light with an essentially diffuse residual reflection rate;
- texturing a second surface by plasma etching of the substrate;
- depositing a transparent conductive layer on the second surface of the substrate so as to form an electrode having a first surface in contact with the second surface of the substrate, and a second surface opposite the first surface of the electrode, so that the second surface retains at least part of the texturing of the second surface of the substrate, the electrical conductive deposition having anisotropic texturing in the plane, the texturing forming valleys whose length is greater than the width and separated by walls of triangular section.
Dependencies are inferred from the claim text.