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US 2020/0090973 A1Published application
Support
AssigneeSPTS Technologies Limited
InventorNICOLAS LAUNAY
Life of this patent
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Abstract
A substrate support includes an electrostatic chuck having an upper surface, and a cover positioned on the electrostatic chuck to cover the upper surface thereof. The cover includes a first face adjacent the upper surface of the electrostatic chuck, a second face for supporting a substrate, and one or more conduits extending through the cover to permit a cooling gas to flow from the second face to the first face. The cover is made from a dielectric material.
Claims17
A substrate support comprising:
- an electrostatic chuck comprising an upper surface;
- a cover positioned on the electrostatic chuck to cover the upper surface thereof, the cover comprising a first face adjacent the upper surface of the electrostatic chuck, a second face for supporting a substrate, and one or more conduits extending through the cover to permit a cooling gas to flow from the second face to the first face;
- wherein the cover is made from a dielectric material.
Dependencies are inferred from the claim text.