Substrate table, a lithographic apparatus and a device manufacturing method

A lithographic apparatus, comprising:

• a projection system configured to project a beam of radiation through a liquid onto a substrate;
• a table comprising a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening at a bottom surface of the table;
• and
• a controller configured to control a supply of liquid to a flow path between the catchment opening and the drain opening such that liquid is supplied to the flow path during at least one selected from:
• startup of the lithographic apparatus, a substrate swap operation and/or a docking operation of the table to a reference frame of the lithographic apparatus.

A device manufacturing method, comprising:

• projecting a patterned beam of radiation through an immersion liquid confined to a space between a projection system and a substrate supported on a substrate table;
• catching immersion liquid in a catchment opening formed in an upper surface of a table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a bottom surface of the table;
• and
• extracting immersion liquid at the drain opening.