Exposure apparatus and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorHikaru Sugita
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AssigneeCanon Kabushiki Kaisha
InventorHikaru Sugita
Estimating the term…
The present invention provides an exposure apparatus for exposing a substrate, including: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator and configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member including a first end portion and a second end portion on a side opposite to the first end portion and having a variation in physical properties falling within a predetermined range, a central portion between the first end portion and the second end portion of the heat radiator is arranged inside the barrel, and the first end portion and the second end portion of the heat radiator are arranged outside the barrel.
An exposure apparatus for exposing a substrate, including:
A method of manufacturing an article, the method comprising:
Dependencies are inferred from the claim text.