Fabrication of Heterojunction Bipolar Transistors with a Selectively Grown Collector/Sub-Collector
AssigneeDuet Microelectronics Inc.
InventorsKeun-Yong Ban, Robert J. Bayruns
Life of this patent
Estimating the term…
Loading patent…
AssigneeDuet Microelectronics Inc.
InventorsKeun-Yong Ban, Robert J. Bayruns
Estimating the term…
A heterojunction bipolar transistor (HBT) and methods of fabrication provide a substrate, a base having a first lateral area, an emitter, a sub-collector having a second lateral area, and a collector above the sub-collector, wherein the second lateral area of the sub-collector is less than the first lateral area of the base, which enables the fabrication of HBTs with high linearity, as measured by an improved third order distortion (OIP3) parameter, while maintaining high gain; which enables the fabrication of HBTs with a selectively grown or overgrown collector/sub-collector; and which reduces a capacitance between the base and collector of the HBTs.
A transistor comprising:
A method for fabricating a transistor comprising:
A method for fabricating a transistor comprising:
Dependencies are inferred from the claim text.