Manufacturing method of semiconductor thin film transistor and display panel using the same

Abstract

A manufacturing method of a semiconductor thin film transistor (TFT) and a display panel are provided. According to the manufacturing method, a substrate is provided. A semiconductor pattern is formed on the substrate. A first insulating layer is formed on the substrate and covers the semiconductor pattern. A first metal layer is formed on the first insulating layer, and the first insulating layer is located between the semiconductor pattern and the first metal layer. A half-tone mask photoresist pattern is formed on the first metal layer. The half-tone mask photoresist pattern exposes a portion of the first metal layer. The portion of the first metal layer exposed by the half-tone mask photoresist pattern is removed to form a gate. The gate covers a portion of the semiconductor pattern. A source and a drain are formed on the semiconductor pattern.

Dependencies are inferred from the claim text.