Microelectronic device interconnect structure
AssigneeIntel Corporation
InventorsManish Dubey, Kousik Ganesan, Suddhasattwa Nad, Thomas Heaton, Sri Chaitra Jyotsna Chavali, Amruthavalli Pallavi Alur
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AssigneeIntel Corporation
InventorsManish Dubey, Kousik Ganesan, Suddhasattwa Nad, Thomas Heaton, Sri Chaitra Jyotsna Chavali, Amruthavalli Pallavi Alur
Estimating the term…
A microelectronic device is formed including two or more structures physically and electrically engaged with one another through coupling of conductive features on the two structures. The conductive features may be configured to be tolerant of bump thickness variation in either of the structures. Such bump thickness variation tolerance can result from a contact structure on a first structure including a protrusion configured to extend in the direction of the second structure and to engage a deformable material on that second structure.
A microelectronic device, comprising:
A method of forming a microelectronic device, comprising:
An electronic system, comprising:
Dependencies are inferred from the claim text.