Dry etching device and electrode thereof
AssigneesHKC CorporationLimited, Chongqing Hkc Optoelectronics Technology Co., Ltd.
InventorChun-Bin WEN
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Abstract
A dry etching device and an electrode thereof are disclosed in this application. The electrode of a dry etching device includes: an electrode plate, a surface of the electrode plate including a component-disposing area and an edge area surrounding the component-disposing area; a barrier ring, disposed in the edge area, and located on a periphery of the component-disposing area; and spacers, disposed on an outer side of the electrode plate, and abutting a periphery of the barrier ring, where the spacer has a plurality of through holes.
Claims15
An electrode of a dry etching device, comprising:
- an electrode plate, a surface of the electrode plate comprising a component-disposing area and an edge area surrounding the component-disposing area;
- a barrier ring, disposed in the edge area, and located on a periphery of the component-disposing area;
- and
- spacers, disposed on an outer side of the electrode plate, and abutting a periphery of the barrier ring, wherein the spacer has a plurality of through holes.
A dry etching apparatus, comprising:
- a chamber;
- a base, disposed inside the chamber;
- a first electrode, disposed on the base, and a surface of the first electrode comprising a component-disposing area and an edge area surrounding the component-disposing area;
- a barrier ring, disposed in the edge area, and located on a periphery of the component-disposing area;
- spacers, disposed on an outer side of an electrode plate, and abutting a periphery of the barrier ring, wherein the spacer has a plurality of through holes;
- a second electrode, disposed inside the chamber, and disposed opposite to the first electrode;
- a gas inlet, disposed on an inner side of the chamber, wherein a horizontal position of the gas inlet is higher than a horizontal position of the first electrode;
- and
- a gas extraction opening, disposed on the inner side of the chamber, wherein a horizontal position of the gas extraction opening is lower than the horizontal position of the first electrode.
A dry etching apparatus, comprising:
- a chamber;
- a base, disposed inside the chamber;
- a first electrode, disposed on the base, a surface of the first electrode comprising a component-disposing area and an edge area surrounding the component-disposing area;
- a barrier ring, disposed in the edge area, and located on a periphery of the component-disposing area;
- spacers, disposed on an outer side of an electrode plate, and abutting a periphery of the barrier ring, wherein the spacer has a plurality of through holes;
- a second electrode, disposed inside the chamber, and disposed opposite to the first electrode;
- a gas inlet, disposed on an inner side of the chamber, wherein a horizontal position of the gas inlet is higher than a horizontal position of the first electrode;
- and
- a gas extraction opening, disposed on the inner side of the chamber, wherein a horizontal position of the gas extraction opening is lower than the horizontal position of the first electrode, wherein
- the spacers are disposed on the periphery of the barrier ring in a manner of equal intervals, unequal intervals, partially equal intervals or no interval;
- the plurality of through holes is evenly, unevenly, or partially evenly provided on the spacer;
- the plurality of through holes has a same shape and size, different shapes and sizes, or partially same shapes and sizes;
- and
- the plurality of through holes is used to restrict a flow rate, a flow direction, and gas distribution uniformity of an etching gas.
Dependencies are inferred from the claim text.