Organic light-emitting display apparatus and method of manufacturing the same

A method of manufacturing an organic light-emitting display apparatus, the method comprising:

• forming a plurality of first electrodes on a substrate and performing a first unit process comprising the steps of:
• (a1) forming a first lift-off layer on the substrate comprising the plurality of first electrodes, the first lift-off layer comprising a fluoropolymer;
• (b1) sequentially forming a first photoresist on the first lift-off layer;
• (c1) patterning the first photoresist to remove a first portion of the first photoresist corresponding to the first electrodes of a first group such that a second portion other than the first portion remains;
• (d1) etching a portion of the first lift-off layer corresponding to the first portion to expose the first electrodes of the first group;
• (e1) sequentially forming a first organic functional layer and a first auxiliary electrode over the first electrodes of the first group and the second portion of the first photoresist, the first organic functional layer comprising a first emission layer;
• and
• (f1) removing the first lift-off layer, the first photoresist, the first organic functional layer, and the first auxiliary electrode remaining on the second portion;
• and
• after the performing of the first unit process, performing, at least once, a second unit process comprising the steps of:
• (a2) forming a second lift-off layer on a resultant structure of step (f1), the second lift-off layer comprising a fluoropolymer;
• (b2) forming a barrier layer and a second photoresist on the second lift-off layer, the barrier layer comprising an inorganic material;
• (c2) patterning the second photoresist and the barrier layer to remove a first portion of the second photoresist corresponding to the first electrodes of a second group such that a second portion other than the first portion remains;
• (d2) etching a portion of the second lift-off layer corresponding to the first portion to expose the first electrodes of the second group;
• (e2) sequentially forming a second organic functional layer and a second auxiliary electrode over the first electrodes of the second group and the second portion of the second photoresist, the second organic functional layer comprising a second emission layer;
• and
• (f2) removing the second lift-off layer, the barrier layer, the second photoresist, the second organic functional layer, and the second auxiliary electrode remaining on the second portion,
• wherein, after the first and second unit processes are performed, a second electrode is formed.