Overlay mark
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Yu CHEN, Ming-Feng SHIEH, Ching-Yu CHANG
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Yu CHEN, Ming-Feng SHIEH, Ching-Yu CHANG
Estimating the term…
An overlay mark includes a first feature extending in an X-direction, wherein the first feature is a first distance from a substrate. The overlay mark further includes a second feature extending in a Y-direction perpendicular to the X-direction, wherein the second feature is a second distance from the substrate, and the second distance is different from the first distance. The overlay mark further includes a third feature extending in the X-direction and the Y-direction, wherein the third feature is a third distance from the substrate, and the third distance is different from the first distance and the second distance.
An overlay mark, comprising:
An overlay mark, comprising:
An overlay mark, comprising:
Dependencies are inferred from the claim text.