Carrier for use in a vacuum system, system for vacuum processing, and method for vacuum processing of a substrate
AssigneeApplied Materials, Inc.
InventorsTommaso VERCESI, Michael Rainer SCHULTHEIS
Life of this patent
Estimating the term…
Abstract
The present disclosure provides a carrier (100) for use in a vacuum system (300). The carrier (100) includes a housing (120) configured to accommodate one or more electronic devices (130) and contain a gaseous environment during the use of the carrier (100) in the vacuum system (300), wherein the carrier (100) is configured to hold at least one of a substrate (10) and a mask (20) used during vacuum processing.
Claims27
A carrier for use in a vacuum system, comprising:
- a housing configured to accommodate one or more electronic devices and contain a gaseous environment during the use of the carrier in the vacuum system,
- wherein the carrier is configured to hold at least one of a substrate and a mask used during vacuum processing.
A carrier for use in a vacuum system, comprising:
- a support structure having a receiving surface for a mask or a substrate thereon and a sealable recess therein to accommodate one or more electronic devices.
A system for vacuum processing, comprising:
- a vacuum chamber;
- a carrier for use in a vacuum system, the carrier comprising:
- a housing configured to accommodate one or more electronic devices and contain a gaseous environment during the use of the carrier in the vacuum system,
- wherein the carrier is configured to hold at least one of a substrate and a mask used during vacuum processing;
- and
- a transport arrangement configured for transportation of the carrier in the vacuum chamber.
A method for vacuum processing of a substrate, comprising:
- supporting at least one of the substrate and a mask on a carrier in a vacuum chamber, wherein the carrier includes a housing accommodating one or more electronic devices, and
- containing a gaseous environment inside the housing during the vacuum processing of the substrate in the vacuum chamber.
A method for vacuum processing of a substrate, comprising:
- supporting at least one of the substrate and a mask on a carrier in a vacuum chamber, wherein the carrier includes a sealable recess accommodating one or more electronic devices and
- maintaining a gaseous environment inside the sealable recess during the vacuum processing of the substrate in the vacuum chamber.
Dependencies are inferred from the claim text.