Methods and apparatus for magnetron assemblies in semiconductor process chambers

Abstract

An apparatus for processing semiconductors that comprises a process chamber with multiple cathodes disposed in a top adapter assembly. The multiple cathodes having magnetron assemblies that comprise a shunt plate for supporting the magnetron assembly, a loop magnetic pole assembly coupled to the shunt plate with a loop magnetic pole, a linear magnetic pole, and a center magnetic pole, the linear magnetic pole extending from the loop magnetic pole into the center magnetic pole which is located at a center of the magnetron assembly, and an open loop magnetic pole arc assembly coupled to the shunt plate surrounding at least a portion of the center magnetic pole without intersecting with the linear magnetic pole. The magnetron assemblies are orientated such that an opening of the open loop magnetic pole arc assembly is oriented towards an outer wall of the shield.

Dependencies are inferred from the claim text.