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US 2019/0378694 A1Published application
Plasma generating apparatus
AssigneeFuji Corporation
InventorsTakahiro JINDO, Toshiyuki IKEDO
Life of this patent
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Abstract
Plasma generating apparatus includes a pair of electrodes configured to generate plasma by discharge, a first supply path configured to supply processing gas along an outer periphery of each of the pair of electrodes, a second supply path configured to supply processing gas between the pair of electrodes, and a suction path configured to suck the processing gas supplied along an outer peripheral surface of each of the pair of electrodes via the first supply path.
Claims10
-9. (canceled)
A plasma generating apparatus comprising:
- a pair of electrodes configured to generate plasma by discharge;
- a first supply path configured to supply processing gas along an outer periphery of each of the pair of electrodes;
- a second supply path configured to supply processing gas between the pair of electrodes;
- and
- a suction path configured to suck the processing gas supplied along an outer peripheral surface of each of the pair of electrodes via the first supply path.
2 more elements
Dependencies are inferred from the claim text.