Generation of Hydrogen Reactive Species For Processing of Workpieces
AssigneeMattson Technology, Inc.
InventorsQi Zhang, Xinliang Lu, Hua Chung, Michael X. Yang
Life of this patent
Estimating the term…
Abstract
Methods, systems, and apparatus for generating hydrogen radicals for processing a workpiece, such as a semiconductor workpiece, are provided. In one example implementation, a method can include generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source; mixing hydrogen gas with the one or more species to generate one or more hydrogen radicals; and exposing the workpiece in a processing chamber to the one or more hydrogen radicals.
Claims20
A method for processing a workpiece, the method comprising:
- generating one or more species in a plasma chamber from an inert gas by inducing a plasma in the inert gas using a plasma source;
- mixing hydrogen gas with the one or more species downstream of the plasma source to generate one or more hydrogen radicals;
- and
- exposing the workpiece in a processing chamber to the one or more hydrogen radicals.
A method for processing a workpiece, the method comprising:
- generating one or more species in an inert gas in a first chamber;
- filtering one or more ions in the first chamber using a separation grid to generate a filtered mixture;
- injecting a hydrogen gas downstream of the first chamber into the filtered mixture to generate one or more hydrogen radicals;
- exposing the workpiece to the one or more hydrogen radicals in a second chamber, the second chamber being separated from the first chamber by the separation grid.
Dependencies are inferred from the claim text.