Measuring a height profile of a hole formed in non-conductive region
AssigneeApplied Materials Israel Ltd.
InventorsKonstantin Chirko, Orit Hava Armon Hershkovich
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AssigneeApplied Materials Israel Ltd.
InventorsKonstantin Chirko, Orit Hava Armon Hershkovich
Estimating the term…
A system, computer program product and a method for measuring a hole. The method may include charging a vicinity of the hole having a nanometric width; obtaining, multiple electron images of the hole; wherein each electron image is formed by sensing electrons of an electron energy that exceeds an electron energy threshold that is associated with the electron image; wherein electron energy thresholds associated with different electron images of the multiple electron images differ from each other; receiving or generating a mapping between height values and the electron energy thresholds; processing the multiple electron images to provide hole measurements; and generating three dimensional measurements of the hole based on the mapping and the hole measurements.
A method for measuring a hole having a nanometric width formed in an object with a particle imager that includes a secondary electron detector and an energy filter disposed between the object and the secondary electron detector, the method comprising:
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A computer program product that stores instructions that, once executed by a computerized system to measure a hole having a nanometric width formed in an object, causes a particle imager that includes a secondary electron detector and an energy filter disposed between the object and the secondary electron detector to perform the steps of:
A particle imager for measuring a hole having a nanometric width formed in an object, the particle imager comprising:
Dependencies are inferred from the claim text.