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AssigneeASML Netherlands B.V.
InventorsLorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
Estimating the term…
Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
1-15. (canceled)
A method comprising:
A reticle comprising:
A metrology system for determining a characteristic of interest relating to at least one structure on a substrate formed by a lithographic process, the metrology apparatus comprising:
A non-transitory computer program product comprising machine-readable instructions for causing a processor to cause operations comprising:
Dependencies are inferred from the claim text.