Imprint lithography

An imprint lithography apparatus, comprising:

• an imprint lithography template arrangement for use in imprinting a pattern into a layer of imprintable medium provided on a substrate;
• an actuator to position and/or deform the imprint lithography template arrangement;
• a substrate stage to hold the substrate;
• a control system configured to at least:
• control a position and deformation of the imprint lithography template relative to the substrate to achieve a position and deformation substantially as intended;
• and
• responsive to the imprint lithography template being positioned and deformed substantially as intended, reduce a control bandwidth related to the deformation of the imprint lithography template.

An imprint lithography apparatus, comprising:

• an imprint lithography template arrangement for use in imprinting a pattern into a layer of imprintable medium provided on a substrate;
• an actuator to position and/or deform the imprint lithography template arrangement;
• a substrate stage to hold the substrate;
• an alignment sensor to align the imprint lithography template arrangement relative to a target portion of the substrate, the alignment sensor having a first detection bandwidth;
• and
• a relative position sensor to measure a relative position between the imprint lithography template arrangement and the substrate, the relative position sensor having a second detection bandwidth greater than the first detection bandwidth of the alignment sensor.

An imprint lithography apparatus, comprising:

• an imprint lithography template arrangement for use in imprinting a pattern into a layer of imprintable medium provided on a substrate;
• an actuator to position and/or deform the imprint lithography template arrangement, the actuator comprising, or is in connection with, a force sensor to measure, directly or indirectly, a force applied by the actuator, the force sensor having a first detection bandwidth;
• a substrate stage to hold the substrate;
• an alignment sensor to align the imprint lithography template arrangement relative to a target portion of the substrate, the alignment sensor having a second detection bandwidth, wherein the first detection bandwidth is greater than the second detection bandwidth.