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US 2019/0377262 A1Published application
Resist underlayer composition, and method of forming patterns using the composition
AssigneeSamsung SDI Co., Ltd.
InventorsShinhyo BAE, Soonhyung KWON, Hyeon PARK, Jaeyeol BAEK, Beomjun JOO, Yoojeong CHOI
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Abstract
A resist underlayer composition and a method of forming patterns using a resist underlayer composition, the resist underlayer composition including a polymer, the polymer including a structural unit that is a reaction product of an isocyanurate compound, the isocyanurate compound having at least one thiol group thereon, and a solvent.
Claims15
A resist underlayer composition, comprising:
- a polymer including a structural unit that is a reaction product of an isocyanurate compound, the isocyanurate compound having at least one thiol group, and
- a solvent.
Dependencies are inferred from the claim text.