Pattern forming method, coating material for imprint pretreatment and substrate pretreatment method

A pattern forming method, comprising:

• dispensing a droplet of an imprint resist discretely onto a liquid film of an imprint pretreatment coating on a substrate such that the droplet spread on the liquid film of the imprint pretreatment coating to yield a spread imprint resist, wherein the imprint pretreatment coating comprises a polymerizable compound and the imprint resist is a polymerizable composition;
• contacting the spread imprint resist with a mold;
• irradiating the spread imprint resist and the imprint pretreatment coating with light to yield a cured layer on the substrate;
• and
• releasing the mold from the cured layer,
• when steps from the contacting the spread imprint resist with a mold to the releasing the mold on each of a plurality of shot areas are collectively called an imprinting step [Im],
• in a time period from an end of the dispensing to a beginning of the imprinting step [Im] in at least one shot area selected from the plurality of the shot areas, the dispensing or the imprinting step [Im] is performed on a shot area different from the selected at least one shot area.

A method for manufacturing a semiconductor device, the method comprising:

• providing a liquid film of an imprint pretreatment coating on a substrate, wherein the imprint pretreatment coating comprises a polymerizable compound;
• dispensing a droplet of an imprint resist onto the liquid film of the imprint pretreatment coating such that the droplet spread on the liquid film of the imprint pretreatment coating to yield a spread imprint resist, wherein the imprint resist is a polymerizable composition;
• contacting the spread imprint resist with a mold;
• irradiating the spread imprint resist and the imprint pretreatment coating with light to yield a cured layer;
• separating the mold from the cured layer;
• and
• etching the substrate via the cured layer;
• wherein
• when steps from the contacting the spread imprint resist with a mold to the releasing the mold on each of a plurality of shot areas are collectively called an imprinting step [Im],
• in a time period from an end of the dispensing to a beginning of the imprinting step [Im] in at least one shot area selected from the plurality of the shot areas, the dispensing or the imprinting step [Im] is performed on a shot area different from the selected at least one shot area.