Systems and Methods for Modifying Mesa Sidewalls
AssigneeCanon Kabushiki Kaisha
InventorEdward Brian Fletcher
Life of this patent
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Abstract
An apparatus, method, or platter for modifying mesa sidewalls of a template by cleaning or coating the mesa sidewalls. In which the template has a pattern area on a first surface of a mesa. Mesa sidewalls surround the first surface of the mesa. The mesa sidewalls are exposed to a gas. The gas modifies the mesa sidewalls. Resistance to the flow of gas towards the pattern area is provided.
Claims24
An apparatus comprising:
- a template chuck configured to hold a template;
- a platter;
- and
- a positioning system, during a first period of time, configured to position the template chuck and the platter at a first position relative to each other;
- wherein the template has a pattern area on a first surface of a mesa;
- wherein mesa sidewalls surround the first surface of the mesa;
- and
- wherein the apparatus is configured to expose the mesa sidewalls to a first gas, wherein the first gas is configured to modify the mesa sidewalls during the first period;
- wherein the first position is such that the platter provides resistance to flow of the first gas towards the pattern area of the template during the first period.
A platter comprising:
- a raised area;
- a first region surrounding the raised area region;
- and
- a first gas source in the first region configured to supply a first gas to the first region;
- and
- wherein the first gas source includes at least one gas port or at least one liquid well.
A method for modifying mesa sidewalls of a template, wherein the template has a pattern area on a mesa, the pattern area is surrounded by mesa sidewalls, a recessed surface of the template is connected to the mesa sidewalls, and the recessed surface surrounds the mesa sidewalls, comprising:
- positioning the template and a platter into a first position relative to each other at a start of a first period, forming a first gap;
- wherein the first gap is formed between the template and the platter when the template and the platter are in the first position;
- wherein the first gap is bounded by at least:
- the platter, the mesa sidewalls, and the recessed surface;
- modifying the mesa sidewalls with a reactive gas in the first gap during the first period;
- wherein during the first period, the platter is configured to protect the pattern area from the reactive gas.
Dependencies are inferred from the claim text.