Back to results
US 2019/0377116 A1Published application
Thin film optics
AssigneeLockheed Martin Corporation
InventorJoseph Robert BUCK
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.
Claims20
A method of manufacturing a thin film optical apparatus, the method comprising:
- providing a substrate;
- applying an alignment layer over the substrate, wherein the alignment layer ranges from about 50 to 100 nm in thickness;
- imprinting a hologram with a desired optic pattern onto the alignment layer;
- and
- applying at least one layer of mesogen material over the alignment layer.
2 more elements
A method of manufacturing an optical apparatus, the method comprising:
- providing a substrate;
- applying at least one alignment layer above the substrate;
- writing a polarization phase hologram into the at least one alignment layer to impart the phase transform of a desired optical pattern;
- and
- applying at least one layer of birefringent material over the alignment layer,
- wherein the at least one layer of birefringent material ranges from about 200 nm to 2000 nm thick.
3 more elements
Dependencies are inferred from the claim text.