Apparatus for and method of performing inspection and metrology process

An inspection/metrology apparatus, comprising:

• a stage configured to load a substrate thereon;
• an object lens provided on the stage;
• an image sensor provided on the object lens;
• an eye lens provided between the image sensor and the object lens to allow an image of the substrate to be imaged on the image sensor;
• a first illumination light source configured to provide a first illumination light having a first bandwidth onto the substrate;
• and
• a second illumination light source configured to provide a second illumination light, having a second bandwidth smaller than the first bandwidth, onto the substrate.

An inspection/metrology method, comprising:

• examining a position of a substrate;
• determining whether it is necessary to perform a defect inspection process on the substrate;
• providing an illumination light of a first bandwidth to the substrate when the defect inspection process is required;
• determining whether it is necessary to perform a surface metrology process on the substrate;
• and
• providing the illumination light of a second bandwidth, which is smaller than the first bandwidth when the surface metrology process is required.