Plasma processing apparatus and temperature control method

A plasma processing apparatus comprising:

• a shower head disposed to face a stage on which a substrate is placed, and including a ceiling plate having a plurality of gas holes formed therein so as to eject a processing gas into a processing container and a base configured to support the ceiling plate, the base including a space formed therein so as to supply the processing gas to the plurality of gas holes;
• a temperature adjustment mechanism including a coolant flow path provided in the shower head;
• and
• a controller configured to:
• acquire a combination of a parameter related to generation of plasma of the processing gas ejected from the shower head toward the substrate and a pressure in the space in the base;
• estimate temperature of the ceiling plate corresponding to the acquired combination of the parameter and the pressure in the space in the base with reference to temperature information indicating the temperature of the ceiling plate corresponding to the combination of the parameter and the pressure in the space in the base;
• and
• control the temperature adjustment mechanism such that the estimated temperature of the ceiling plate becomes a target temperature when a plasma processing is performed on the substrate.