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AssigneeLam Research Corporation
InventorsMichael John SELEP, Andrew James BORTH, John Michael WILTSE, Damien Martin SLEVIN, Eric MADSEN
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A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.
A Chemical Vapor Deposition (CVD) tool, comprising
A Chemical Vapor Deposition (CVD) tool, comprising:
A Chemical Vapor Deposition Tool (CVD), comprising:
Dependencies are inferred from the claim text.