Display panel and method for manufacturing same

A method for manufacturing a display panel, comprising:

• a step A of forming a base layer on a substrate;
• a step B of forming a thin film transistor (TFT) device layer on the base layer;
• a step C of forming an organic light-emitting diode (OLED) device layer on the TFT device layer;
• a step D of forming a first inorganic material on the OLED device layer;
• a step E of modifying a surface of the first inorganic material to form a first inorganic layer, wherein the first inorganic layer is configured to prevent water outside of the display panel from contacting the OLED device layer, and to increase flowability of an organic buffer layer that is to be formed on a surface of the first inorganic layer;
• a step F of forming the organic buffer layer on the first inorganic layer;
• and
• a step G of forming a second inorganic layer on the organic buffer layer;
• wherein the step E includes:
• a step e1 of injecting a trimethyl aluminum gas towards the surface of the first inorganic material to have hydroxyl functional groups on the surface of the first inorganic material react with the trimethyl aluminum gas, so as to form aluminum containing hydrocarbon functional groups on the surface of the first inorganic material;
• and
• a step e2 of injecting a hydroxyl functional group containing alkyl alcohol gas towards the surface of the first inorganic material to transfer hydroxyl functional groups of the aluminum containing hydrocarbon functional groups on the surface of the first inorganic material into alkoxy chains;
• wherein the organic buffer layer covers a plurality of foreign matter particulate on the first inorganic layer, and is configured to planarize the surface of the first inorganic layer having a device disposed underneath, and to release stress generated from the first inorganic layer;
• and
• wherein a contact angle of the organic buffer layer with the modified surface of the first inorganic layer is less than 5 degrees.