Imaging panel and method for producing same

An imaging panel producing method for producing an imaging panel that generates an image based on scintillation light that is obtained from X-rays transmitted through an object, the method comprising the steps of, in an active area on a substrate:

• forming a thin film transistor;
• forming a first insulating film on the thin film transistor;
• forming, on a drain electrode of the thin film transistor, a first contact hole that passes through the first insulating film, and forming a lower electrode conductive film that covers the first insulating film;
• etching the lower electrode conductive film, so as to form a lower electrode on the first insulating film so that the lower electrode is connected with the drain electrode through the first contact hole;
• forming a photoelectric conversion layer on the lower electrode, and forming an upper electrode on the photoelectric conversion layer;
• forming a second insulating film that covers the upper electrode, and forming a second contact hole that pass through the second insulating film;
• forming a bias line conductive film above the second insulating film, and etching the bias line conductive film, so as to form a bias line to which a bias voltage is applied;
• and
• forming a conductive film that is connected with the upper electrode through the second contact hole,
• wherein the step of forming the thin film transistor or the step of forming the lower electrode includes a sub-step of forming a first conductive layer in a terminal area on the substrate, the first conductive layer being made of the same material as that of any one element of the gate electrode and the source electrode of the thin film transistor, and the lower electrode,
• the step of forming the first insulating film or the step of forming the second insulating film includes a sub-step of forming a terminal first insulating film that is made of the same material as that of the first insulating film or the second insulating film and has a first opening on a part of the first conductive layer,
• the step of forming the conductive film includes a sub-step of forming a second conductive layer that is made of the same material as that of the conductive film and overlaps with the first conductive layer above the terminal first insulating film, at a position where the first opening is provided, and
• the step of forming at least one element arranged in an upper layer with respect to the element made of the same material as that of the first conductive layer, the at least one element being among the source electrode, the lower electrode, and the bias line, includes a sub-step of forming a cover layer that is made of the same material as that of the at least one element, and is arranged at a position where the first opening is provided, so as to be interposed between the first conductive layer and the second conductive layer.