US 2019/0355630 A1 · SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND THERMOCOUPLE SUPPORT

Abstract

A substrate processing apparatus includes: a reaction tube configured to accommodate a substrate holder holding a plurality of substrates and process a substrate held on the substrate holder; a heating unit installed outside the reaction tube and configured to heat an inside of the reaction tube; a protection tube installed to extend in a vertical direction in contact with an outer wall of the reaction tube; an insulating tube disposed inside the protection tube and having through-holes extending in a vertical direction; a thermocouple having a thermocouple junction provided at an upper end thereof, and thermocouple wires joined at the thermocouple junction and inserted into the through-holes of the insulating tube; a gas supply unit configured to supply a gas, for processing a substrate accommodated in the reaction tube, into the reaction tube; and an exhaust unit configured to exhaust a gas from the reaction tube.

Claims8

Dependent claims

An assembly for a substrate processing apparatus, the assembly comprising:

a reaction tube, having a substantially cylindrical shape for accommodating a substrate holder in a vertical direction, the substrate holder holding a plurality of substrate, each substrate being in a horizontal posture and stacked vertically;
an insulating tube including a support portion for supporting a thermocouple junction, the thermocouple junction being connected to a pair of thermocouple wires, and a pair of through-holes that accommodate the pair of thermocouple wires therein vertically;
and
a thermocouple protection, mechanically fixed to an outer side surface of the reaction tube in the vertical direction, the thermocouple protection having a shape for covering a part of the insulating tube, an inner diameter of the space being smaller than a diameter of the outer side surface of the reaction tube.

1 more element

A assembly for a substrate processing apparatus, the assembly comprising:

a reaction tube, having a substantially cylindrical shape for accommodating a substrate holder in a vertical direction, the substrate holder holding a plurality of substrate, each substrate being in a horizontal posture and stacked vertically;
a first insulating tube including a first support portion for supporting a first thermocouple junction, the first thermocouple junction being connected to a first pair of thermocouple wires, and a first pair of through-holes that accommodate the first pair of thermocouple wires therein vertically;
a first thermocouple protection, mechanically fixed to a first outer side surface of the reaction tube in the vertical direction, the first thermocouple protection having a first shape for covering a first part of the first insulating tube, a first inner diameter of the first space being smaller than a diameter of the outer side surface of the reaction tube;
a second insulating tube including a second support portion for supporting a second thermocouple junction, the second thermocouple junction being connected to a second pair of thermocouple wires, and a second pair of through-holes that accommodate the second pair of thermocouple wires therein vertically;
and
a second thermocouple protection, mechanically fixed to a second outer side surface of the reaction tube in the vertical direction, the second thermocouple protection having a second shape for covering a second part of the second insulating tube, a second inner diameter of the second space being smaller than a diameter of the outer side surface of the reaction tube.

3 more elements

Dependencies are inferred from the claim text.

Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support

Life of this patent

Substrate processing apparatus, method of manufacturing semiconductor device, and thermocouple support

Life of this patent

Abstract

Claims8