US 2019/0355628 A1 · PROCESS WINDOW ANALYSIS

Abstract

A method for process analysis includes acquiring first inspection data, using a first inspection modality, with respect to a substrate having multiple instances of a predefined pattern of features formed thereon using different, respective sets of process parameters. Characteristics of defects identified in the first inspection data are processed so as to select a first set of defect locations in which the first inspection data are indicative of an influence of the process parameters on the defects. Second inspection data are acquired, using a second inspection modality having a finer resolution than the first inspection modality, of the substrate at the locations in the first set. The defects appearing in the second inspection data are analyzed so as to select, from within the first set of the locations, a second set of the locations in which the second inspection data are indicative of an optimal range of the process parameters.

Claims20

Dependent claims

A method comprising:

acquiring, by a processor, inspection data collected by using an inspection modality during an inspection process of a substrate having instances of a pattern, each of the instances of the pattern being formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate;
identifying, by the processor, defects at locations in the instances of the pattern based on the inspection data;
analyzing, by the processor, characteristics of the identified defects to select a portion of the locations at which the inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects;
determining a range of the process parameters associated with the fabrication process on the defects based on the portion of the locations at which the inspection data is indicative of the influence of the process parameters on the identified defects;
and
determining subsequent process parameters for fabrication of a target device based on the range of the process parameters.

3 more elements

A system comprising:

a memory;
and
a processor, operatively coupled with the memory, to:
acquire inspection data collected by using an inspection modality during an inspection process of a substrate having instances of a pattern, each of the instances of the pattern being formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate;
identify defects at locations in the instances of the pattern based on the inspection data;
analyze characteristics of the identified defects to select a portion of the locations at which the inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects;
determine a range of the process parameters associated with the fabrication process on the defects based on the portion of the locations at which the inspection data is indicative of the influence of the process parameters on the identified defects;
and
determine subsequent process parameters for fabrication of a target device based on the range of the process parameters.

6 more elements

A non-transitory computer readable medium comprising instructions, which when executed by a processor, cause the processor to perform operations comprising:

acquiring, by the processor, inspection data collected by using an inspection modality during an inspection process of a substrate having instances of a pattern, each of the instances of the pattern being formed by a fabrication process utilizing different respective sets of process parameters associated with the fabrication process of the substrate;
identifying, by the processor, defects at locations in the instances of the pattern based on the inspection data;
analyzing, by the processor, characteristics of the identified defects to select a portion of the locations at which the inspection data is indicative of an influence of the process parameters associated with the fabrication process on the defects;
determining a range of the process parameters associated with the fabrication process on the defects based on the portion of the locations at which the inspection data is indicative of the influence of the process parameters on the identified defects;
and
determining subsequent process parameters for fabrication of a target device based on the range of the process parameters.

3 more elements

Dependencies are inferred from the claim text.

Process window analysis

Life of this patent

Process window analysis

Life of this patent

Abstract

Claims20