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AssigneeSumco Corporation
InventorMasaya SAKURAI
Estimating the term…
Provided is a lift pin for an epitaxial growth apparatus, which can prevent the back surface of a silicon wafer from being damaged by the lift pin, reduce emission of dust due to the rubbing of the lift pin against the wall surface of a through hole in a susceptor, and prevent peeling of glassy carbon. The lift pin has a straight trunk part to be inserted through the through hole; a head part to be made to abut a silicon wafer; and a cover part covering at least a top of the head part. The straight trunk part and the head part are made of a porous body, the cover part is made of a carbon-based covering material, and at least part of voids of the porous body of the head part is filled with the cover part.
A lift pin which is inserted through a through hole of a susceptor placed in an epitaxial growth apparatus so that the lift pin is movable in directions in which the through hole extends, and moves a silicon wafer placed on the susceptor up and down with respect to the susceptor while supporting the silicon wafer, comprising:
Dependencies are inferred from the claim text.