Method of processing substrate and substrate processing apparatus

A substrate processing apparatus, comprising:

• a process container in which a substrate is accommodated and to which a processing gas is supplied via a processing gas supply;
• a substrate mounting table arranged in the process container and having a refrigerant passage through which a refrigerant flows and a heater embedded therein;
• a chiller configured to circulate the refrigerant with the refrigerant passage;
• and
• a controller configured to adjust a temperature of the substrate mounting table between a first temperature in a first process and a second temperature higher than the first temperature in a second process,
• wherein the controller is configured to:
• execute a process in which the refrigerant at a first flow rate for maintaining a set temperature of the chiller is allowed to flow from the chiller to the refrigerant passage and the heater is operated so that the temperature of the substrate mounting table becomes the second temperature when the temperature of the substrate mounting table is adjusted from the first temperature to the second temperature, and
• execute a process in which the refrigerant at a second flow rate larger than the first flow rate is allowed to flow from the chiller to the refrigerant passage and the heater is operated, or an operation of the heater is stopped so that the temperature of the substrate mounting table becomes the first temperature when the temperature of the substrate mounting table is adjusted from the second temperature to the first temperature.