Method for synchronous wet etching processing of differential microstructures

A method for synchronous wet etching processing of differential microstructures, comprising:

• step a:
• performing photoetching on a processing surface of a workpiece to be processed to develop the processing surface of the workpiece;
• wherein a pattern area to be processed on the processing surface of the workpiece to be processed is exposed, and a pattern area without processing is covered by a photoresist layer;
• step b:
• affixing a mask to a surface of the workpiece, opposite to the processing surface;
• wherein a processing pattern on the mask has the same shape as and aligns with the pattern area to be processed on the processing surface;
• step c:
• continuously cooling the mask affixed to the surface of the workpiece;
• step d:
• placing the cooled mask and the workpiece to be processed in a wet etching device;
• and adding an etchant to the processing surface of the workpiece to start etching;
• step e:
• setting an etching time;
• then removing the mask and the workpiece from the wet etching device after the set etching time;
• stopping the etching;
• separating the mask and the workpiece to obtain a workpiece with a etching structure.