Light generator including debris shielding assembly, photolithographic apparatus including the light generator, and method of manufacturing integrated circuit device using the photolithographic apparatus

A method of manufacturing an integrated circuit (IC) device, the method comprising:

• forming a photoresist layer on a substrate;
• and
• exposing the photoresist layer to light by using a photolithographic apparatus including a light generator,
• wherein the light generator includes:
• a chamber having a plasma generation space,
• an optical collector in the chamber, the optical collector having a reflective surface, and
• a debris shielding assembly between the optical collector and the plasma generation space in the chamber,
• wherein the debris shielding assembly includes:
• a protective film being spaced apart from the reflective surface with a protective space therebetween and facing the reflective surface, the protective space including an optical path, and
• a protective frame that is in contact with an edge portion of the optical collector and supports the protective film.

A method of manufacturing an integrated circuit (IC) device, the method comprising:

• forming a photoresist layer on a substrate;
• and
• exposing the photoresist layer to light by using a photolithographic apparatus including a light generator,
• wherein the light generator includes:
• a chamber having a plasma generation space;
• an optical collector in the chamber, the optical collector having a reflective surface;
• and
• a debris shielding assembly between the optical collector and the plasma generation space in the chamber,
• wherein the debris shielding assembly includes a protective film facing the reflective surface with a protective space therebetween, the protective space including an optical path, the protective film having a through hole formed in a position corresponding to the optical path in the protective film.