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US 2019/0355558 A1Published application
Plasma Generation Apparatus
AssigneeKorea Research Institute of Standards and Science
InventorsHyo Chang LEE, Jung-Hyung KIM, Dae-Jin SEONG
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Abstract
A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.
Claims20
A plasma generation apparatus comprising a plasma generation unit,
- wherein the plasma generation unit has a spherical or elliptical cavity,
- the plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity, and
- the cavity has a plasma extraction hole to communicate with an external space.
A plasma generation apparatus comprising:
- a plasma generation unit having a spherical or elliptical cavity and a plasma extraction hole, formed to communicate an external space with the cavity, receiving radio-frequency (RF) power to generate plasma in the cavity, and formed of a conductive material;
- a parasitic discharge prevention unit disposed to cover the plasma generation unit to prevent generation of parasitic plasma, having an auxiliary hole aligned with the plasma extraction hole, and formed of an insulating material;
- and
- an RF power supply configured to supply RF power having a driving frequency, corresponding to a bounce resonance frequency given by temperature of electrons in the cavity and a diameter of the cavity, to the plasma generation unit.
1 more element
A plasma processing apparatus comprising:
- a vacuum chamber;
- a plasma generation unit disposed inside the vacuum chamber, having a plurality of spherical or elliptical cavities and plasma extraction holes, formed to respectively communicate an internal space of the vacuum chamber with the plurality of cavities, receiving RF power to generate plasma in the cavities, and formed of a conductive material;
- a parasitic discharge prevention unit disposed to cover the plasma generation unit to prevent generation of parasitic plasma, having auxiliary holes respectively aligned with the plasma extraction holes, and formed of an insulating material;
- and
- a radio-frequency (RF) power supply configured to supply RF power, having a driving frequency corresponding to a bounce resonance frequency given by temperature of electrons in the cavity and a diameter of the cavity, to the plasma generation unit.
2 more elements
Dependencies are inferred from the claim text.