Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method

A multiple electron beam inspection apparatus comprising:

• an electromagnetic lens configured to refract multiple primary electron beams incident;
• an aberration corrector arranged in a magnetic field of the electromagnetic lens, and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple primary electron beams;
• an objective lens configured to focus the multiple primary electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object;
• and
• a detector configured to detect multiple secondary electron beams emitted due to irradiation of the multiple primary electron beams onto the target object.

A multiple electron beam irradiation method comprising:

• receiving multiple electron beams by an electromagnetic lens, and refracting them by it;
• applying a bias potential and a deflection potential individually to each of the multiple electron beams by an aberration corrector arranged in a magnetic field of the electromagnetic lens;
• and
• focusing the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object by an objective lens.