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US 2019/0355544 A1Published application
Charged particle beam system and method
AssigneeCarl Zeiss MultiSEM GmbH
InventorsChristoph Riedesel, Dirk Zeidler
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Abstract
A charged particle beam system includes a charged particle source, a multi beam generator, an objective lens, a projection system, and a detector system. The projection system includes a first subcomponent configured to provide low frequency adjustments, and the projection system comprises a second subcomponent configured to provide a high frequency adjustments.
Claims20
A charged particle beam system, comprising:
- a charged particle source configured to generate a first charged particle beam;
- a multi beam generator configured to generate a plurality of charged particle beamlets from an incoming first charged particle beam such that each individual beamlet of the plurality of charged particle beamlets is spatially separated from other beamlets of the plurality of charged particle beamlets;
- an objective lens configured to focus incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet of the plurality of charged particle beamlets impinges in the first plane is spatially separated from a second region in which a second individual beamlet of the plurality of charged particle beamlets impinges in the first plane;
- a projection system;
- and
- a detector system comprising a plurality of individual detectors,
- wherein:
- the projection system is configured to image interaction products leaving the first region within the first plane due to impinging charged particles onto a first one of the plurality of individual detectors;
- the projection system is configured to image interaction products leaving the second region in the first plane due to impinging charged particles onto a second one of the plurality of individual detectors;
- the projection system comprises a first subcomponent configured to provide low frequency adjustments;
- and
- the projection system comprises a second subcomponent configured to provide a high frequency adjustments.
9 more elements
A method, comprising:
- a) aligning a multi beam charged particle beam system using static methods and static charged particle optical elements of the multi beam charged particle beam system;
- b) rigging and starting a workflow;
- and
- c) activating a fast multi beam projection alignment system of the multi beam charged particle beam system before a first image is recorded, and
- d) controlling the fast multi beam projection alignment system for an optimal imaging of interaction products onto a plurality of detectors,
- wherein, during a), the fast multi beam projection alignment system is in an off state.
3 more elements
Dependencies are inferred from the claim text.