US 2019/0318946 A1 · SUBSTRATE HEATING UNIT AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

Abstract

The inventive concept relates to a substrate heating unit. The substrate heating unit includes a chuck stage having an inner space defined by a base and sidewalls, a heating unit provided in the inner space of the chuck stage, and a quartz window that covers the inner space of the chuck stage and has an upper surface on which the substrate is placed. The heating unit includes a heating plate having a disk shape with an opening in the center thereof and heating modules installed in respective heating zones on the heating plate that are divided from each other, each heating module having a printed circuit board on which heating light sources emitting light for heating are mounted.

Claims23

Dependent claims

An apparatus for supporting a substrate, the apparatus comprising:

a chuck stage having an inner space defined by a base and sidewalls;
a heating unit provided in the inner space of the chuck stage;
and
a quartz window configured to cover the inner space of the chuck stage, the quartz window having an upper surface on which the substrate is placed,
wherein the heating unit includes:
a heating plate having a disk shape with an opening in the center thereof;
and
heating modules mounted on the heating plate, each having a printed circuit board on which heating light sources emitting light for heating are mounted.

5 more elements

Dependencies are inferred from the claim text.

Substrate heating unit and substrate processing apparatus having the same

Life of this patent

Substrate heating unit and substrate processing apparatus having the same

Life of this patent

Abstract

Claims23