Processing Of Workpieces With Reactive Species Generated Using Alkyl Halide
AssigneeMattson Technology, Inc.
InventorsMichael X. Yang, Hua Chung, Xinliang Lu
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Abstract
Methods for material removal of a film, such as a metal nitride film, from a workpiece are provided. One example implementation is directed to a method for processing a workpiece. The workpiece can include a film (e.g., a metal nitride film). The method can include generating one or more species (e.g., hydrogen radicals, excited inert gas molecules, etc.). The method can include mixing alkyl halide with the one or more species to generate one or more alkyl radicals. The method can include exposing the film to the one or more alkyl radicals.
Claims22
A method for processing a workpiece, the workpiece comprising a film, the method comprising:
- generating one or more species by inducing a plasma in a process gas using a plasma source;
- mixing alkyl halide with the one or more species to generate one or more alkyl radicals;
- exposing the film to the one or more alkyl radicals.
The method of claim 5, wherein the film comprises titanium nitride.
A method for processing a workpiece containing a metal and nitrogen containing film, the method comprising:
- generating one or more species in a mixture in a first chamber;
- filtering one or more ions in the first chamber to generate a filtered mixture;
- injecting one or more alkyl halides in the filtered mixture to generate one or more alkyl radicals;
- exposing the metal and nitrogen containing film to the one or more alkyl radicals in a second chamber, the second chamber being separated from the first chamber.
Dependencies are inferred from the claim text.